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Mendeley readers
| Title |
Fabrication of Ordered, Large Scale, Horizontally‐Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach
|
|---|---|
| Published in |
Advanced Materials, November 2013
|
| DOI | 10.1002/adma.201304096 |
| Pubmed ID | |
| Authors |
Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T. Shaw, Justin D. Holmes, Michael A. Morris |
| Abstract |
A simple technique is demonstrated to fabricate horizontal, uniform, and hexagonally arranged Sinanowire arrays with controlled orientation and density at spatially well defined locations on a substrate based on an in situ hard-mask pattern-formation approach by microphase-separated block-copolymer thin films. The technique may have significant application in the manufacture of transistor circuitry. |
Mendeley readers
The data shown below were compiled from readership statistics for 43 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Korea, Republic of | 1 | 2% |
| India | 1 | 2% |
| Unknown | 41 | 95% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Student > Ph. D. Student | 12 | 28% |
| Researcher | 11 | 26% |
| Student > Master | 4 | 9% |
| Student > Doctoral Student | 3 | 7% |
| Student > Bachelor | 2 | 5% |
| Other | 8 | 19% |
| Unknown | 3 | 7% |
| Readers by discipline | Count | As % |
|---|---|---|
| Materials Science | 14 | 33% |
| Chemistry | 13 | 30% |
| Engineering | 5 | 12% |
| Physics and Astronomy | 4 | 9% |
| Environmental Science | 2 | 5% |
| Other | 3 | 7% |
| Unknown | 2 | 5% |