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Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering

Overview of attention for article published in Journal of Applied Physics, March 2017
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2 X users

Citations

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21 Dimensions

Readers on

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37 Mendeley
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Title
Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering
Published in
Journal of Applied Physics, March 2017
DOI 10.1063/1.4978349
Authors

Julien Keraudy, Brice Delfour-Peyrethon, Axel Ferrec, Javier Garcia Molleja, Mireille Richard-Plouet, Christophe Payen, Jonathan Hamon, Benoît Corraze, Antoine Goullet, Pierre-Yves Jouan

X Demographics

X Demographics

The data shown below were collected from the profiles of 2 X users who shared this research output. Click here to find out more about how the information was compiled.
Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 37 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Sweden 1 3%
Unknown 36 97%

Demographic breakdown

Readers by professional status Count As %
Researcher 14 38%
Student > Ph. D. Student 10 27%
Professor 3 8%
Other 3 8%
Professor > Associate Professor 2 5%
Other 4 11%
Unknown 1 3%
Readers by discipline Count As %
Materials Science 11 30%
Physics and Astronomy 7 19%
Engineering 4 11%
Energy 3 8%
Chemistry 2 5%
Other 2 5%
Unknown 8 22%
Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 1. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 16 May 2017.
All research outputs
#18,546,002
of 22,968,808 outputs
Outputs from Journal of Applied Physics
#15,932
of 20,533 outputs
Outputs of similar age
#235,080
of 308,014 outputs
Outputs of similar age from Journal of Applied Physics
#43
of 88 outputs
Altmetric has tracked 22,968,808 research outputs across all sources so far. This one is in the 11th percentile – i.e., 11% of other outputs scored the same or lower than it.
So far Altmetric has tracked 20,533 research outputs from this source. They receive a mean Attention Score of 3.7. This one is in the 16th percentile – i.e., 16% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 308,014 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 12th percentile – i.e., 12% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 88 others from the same source and published within six weeks on either side of this one. This one is in the 29th percentile – i.e., 29% of its contemporaries scored the same or lower than it.