| Title |
3D atomic imaging of SiGe system by X-ray fluorescence holography
|
|---|---|
| Published in |
Journal of Materials Science: Materials in Electronics, May 2003
|
| DOI | 10.1023/a:1023993911437 |
| Authors |
K. Hayashi, Y. Takahashi, E. Matsubara, K. Nakajima, N. Usami |
Attention Score in Context
This research output has an Altmetric Attention Score of 3. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 04 November 2014.
All research outputs
#8,535,472
of 25,374,917 outputs
Outputs from Journal of Materials Science: Materials in Electronics
#152
of 844 outputs
Outputs of similar age
#18,826
of 54,885 outputs
Outputs of similar age from Journal of Materials Science: Materials in Electronics
#2
of 2 outputs
Altmetric has tracked 25,374,917 research outputs across all sources so far. This one is in the 43rd percentile – i.e., 43% of other outputs scored the same or lower than it.
So far Altmetric has tracked 844 research outputs from this source. They receive a mean Attention Score of 2.9. This one is in the 33rd percentile – i.e., 33% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 54,885 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 11th percentile – i.e., 11% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 2 others from the same source and published within six weeks on either side of this one.