| Title |
Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
|
|---|---|
| Published in |
Journal of the American Society for Mass Spectrometry, May 2015
|
| DOI | 10.1007/s13361-015-1159-1 |
| Pubmed ID | |
| Authors |
Zhaoying Wang, Bingwen Liu, Evan W. Zhao, Ke Jin, Yingge Du, James J. Neeway, Joseph V. Ryan, Dehong Hu, Kelvin H. L. Zhang, Mina Hong, Solenne Le Guernic, Suntharampilai Thevuthasan, Fuyi Wang, Zihua Zhu |
| Abstract |
The use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass (SON68) and layered hole-perovskite oxide thin films were selected as model systems because of their fundamental and practical significance. Our results show that high sputter rates and accurate interfacial information can be achieved simultaneously for argon cluster sputtering, whereas this is not the case for cesium and oxygen sputtering. Therefore, the implementation of an argon cluster sputtering source can significantly improve the analysis efficiency of insulating materials and, thus, can expand its applications to the study of glass corrosion, perovskite oxide thin film characterization, and many other systems of interest. |
Mendeley readers
The data shown below were compiled from readership statistics for 45 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Unknown | 45 | 100% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Student > Ph. D. Student | 15 | 33% |
| Researcher | 13 | 29% |
| Student > Master | 4 | 9% |
| Student > Doctoral Student | 2 | 4% |
| Professor | 1 | 2% |
| Other | 2 | 4% |
| Unknown | 8 | 18% |
| Readers by discipline | Count | As % |
|---|---|---|
| Chemistry | 12 | 27% |
| Materials Science | 8 | 18% |
| Engineering | 3 | 7% |
| Medicine and Dentistry | 2 | 4% |
| Pharmacology, Toxicology and Pharmaceutical Science | 2 | 4% |
| Other | 4 | 9% |
| Unknown | 14 | 31% |
Attention Score in Context
This research output has an Altmetric Attention Score of 6. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 26 February 2019.
All research outputs
#5,447,195
of 25,374,917 outputs
Outputs from Journal of the American Society for Mass Spectrometry
#555
of 3,835 outputs
Outputs of similar age
#64,318
of 279,161 outputs
Outputs of similar age from Journal of the American Society for Mass Spectrometry
#6
of 37 outputs
Altmetric has tracked 25,374,917 research outputs across all sources so far. Compared to these this one has done well and is in the 75th percentile: it's in the top 25% of all research outputs ever tracked by Altmetric.
So far Altmetric has tracked 3,835 research outputs from this source. They receive a mean Attention Score of 3.8. This one has done well, scoring higher than 78% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 279,161 tracked outputs that were published within six weeks on either side of this one in any source. This one has done well, scoring higher than 75% of its contemporaries.
We're also able to compare this research output to 37 others from the same source and published within six weeks on either side of this one. This one has done well, scoring higher than 78% of its contemporaries.