| Title |
Laser annealing of hydrogenated amorphous silicon
|
|---|---|
| Published in |
Journal of Electronic Materials, September 1980
|
| DOI | 10.1007/bf02822725 |
| Authors |
J. I. Pankove, C. P. Wu, C. W. Magee, J. T. McGinn |
Attention Score in Context
This research output has an Altmetric Attention Score of 6. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 17 January 2022.
All research outputs
#4,721,979
of 22,896,955 outputs
Outputs from Journal of Electronic Materials
#67
of 1,368 outputs
Outputs of similar age
#705
of 6,580 outputs
Outputs of similar age from Journal of Electronic Materials
#1
of 3 outputs
Altmetric has tracked 22,896,955 research outputs across all sources so far. Compared to these this one has done well and is in the 76th percentile: it's in the top 25% of all research outputs ever tracked by Altmetric.
So far Altmetric has tracked 1,368 research outputs from this source. They receive a mean Attention Score of 3.5. This one has done well, scoring higher than 84% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 6,580 tracked outputs that were published within six weeks on either side of this one in any source. This one has done well, scoring higher than 76% of its contemporaries.
We're also able to compare this research output to 3 others from the same source and published within six weeks on either side of this one. This one has scored higher than all of them