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Photoresist-free lithography of 3μm wide UO3 lines from amorphous films of uranyl complexes

Overview of attention for article published in Journal of Materials Science, September 2004
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Mentioned by

patent
3 patents

Citations

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10 Dimensions

Readers on

mendeley
2 Mendeley
Title
Photoresist-free lithography of 3μm wide UO3 lines from amorphous films of uranyl complexes
Published in
Journal of Materials Science, September 2004
DOI 10.1007/bf00354554
Authors

L. B. Goetting, B. J. Palmer, M. Gao, R. H. Hill

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 2 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Brazil 1 50%
Unknown 1 50%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 1 50%
Student > Master 1 50%
Readers by discipline Count As %
Materials Science 1 50%
Chemistry 1 50%
Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 3. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 11 July 2006.
All research outputs
#8,535,472
of 25,374,917 outputs
Outputs from Journal of Materials Science
#1,037
of 4,988 outputs
Outputs of similar age
#23,892
of 72,729 outputs
Outputs of similar age from Journal of Materials Science
#46
of 203 outputs
Altmetric has tracked 25,374,917 research outputs across all sources so far. This one is in the 43rd percentile – i.e., 43% of other outputs scored the same or lower than it.
So far Altmetric has tracked 4,988 research outputs from this source. They receive a mean Attention Score of 3.4. This one is in the 25th percentile – i.e., 25% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 72,729 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 11th percentile – i.e., 11% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 203 others from the same source and published within six weeks on either side of this one. This one is in the 2nd percentile – i.e., 2% of its contemporaries scored the same or lower than it.