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Development of a Conductive Photoresist with a Mixture of SU-8 and Hcl Doped Polyaniline

Overview of attention for article published in this source, November 2005
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Mentioned by

news
1 news outlet

Citations

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6 Dimensions

Readers on

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22 Mendeley
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Title
Development of a Conductive Photoresist with a Mixture of SU-8 and Hcl Doped Polyaniline
Published by
Institute of Electrical and Electronics Engineers (IEEE), November 2005
DOI 10.1109/tencon.2005.300927
Authors

Uma M Annaiyan, Kourosh Kalantar-Zadeh, Qiang Fang, Irena Cosic

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 22 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
United States 1 5%
India 1 5%
Sweden 1 5%
Unknown 19 86%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 9 41%
Researcher 4 18%
Student > Doctoral Student 3 14%
Student > Bachelor 2 9%
Student > Master 1 5%
Other 1 5%
Unknown 2 9%
Readers by discipline Count As %
Engineering 11 50%
Physics and Astronomy 3 14%
Chemistry 2 9%
Materials Science 2 9%
Agricultural and Biological Sciences 1 5%
Other 0 0%
Unknown 3 14%