Reactive ion etching of quartz and Pyrex for microelectronic applications

Overview of attention for article published in Journal of Applied Physics, October 2002

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Birefringent waveplate and method for forming a waveplate having a birefringent…

Grant US-11747639-B2

United States of America

Ultra-high speed anisotropic reactive ion etching

Grant US-9966232-B2

United States of America

Imprinting of partial fields at the edge of the wafer

Grant US-7802978-B2

United States of America

Method and system for double-sided patterning of substrates

Grant US-7670529-B2

United States of America

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