Deactivation of ultrashallow boron implants in preamorphized silicon after nonmelt laser annealing with multiple scans

Overview of attention for article published in Applied Physics Letters, November 2006

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Defect engineering in metal oxides via surfaces

Grant US-8871670-B2

United States of America

Junction profile engineering using staged thermal annealing

Grant US-8058134-B2

United States of America

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