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Plasma Facing Material Test in Reverse Field Pinch Plasma Device

Overview of attention for article published in Shinku, January 1991
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Title
Plasma Facing Material Test in Reverse Field Pinch Plasma Device
Published in
Shinku, January 1991
DOI 10.3131/jvsj.34.178
Authors

Hazime SHIMIZU, Kazuo SHIMADA, Youichi HIRANO, YAGI Yasuyuki, Yoshinori MAEZIMA, Hiroshi HIROTA

Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 3. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 06 July 2020.
All research outputs
#8,534,528
of 25,373,627 outputs
Outputs from Shinku
#6
of 51 outputs
Outputs of similar age
#11,815
of 59,481 outputs
Outputs of similar age from Shinku
#1
of 4 outputs
Altmetric has tracked 25,373,627 research outputs across all sources so far. This one is in the 43rd percentile – i.e., 43% of other outputs scored the same or lower than it.
So far Altmetric has tracked 51 research outputs from this source. They receive a mean Attention Score of 3.1. This one is in the 3rd percentile – i.e., 3% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 59,481 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 19th percentile – i.e., 19% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 4 others from the same source and published within six weeks on either side of this one. This one has scored higher than all of them