Critical dimension control in photolithography based on the yield by a simulation program

Overview of attention for article published in Microelectronics Reliability, May 2006

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Chemical amplification methods and techniques for developable bottom anti-reflective…

Grant US-12165870-B2

United States of America

METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHIC APPARATUS

Application US-20220413391-A1

United States of America

Method and process for stochastic driven detectivity healing

Grant US-11163236-B2

United States of America

Critical dimension control by use of photo-sensitized chemicals or photo-sensitized…

Grant US-10551743-B2

United States of America

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