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Attention Score in Context
| Title |
Abnormal Degradation Behaviors Under Negative Bias Stress in Flexible p-Channel Low-Temperature Polycrystalline Silicon Thin-Film Transistors After Laser Lift-Off Process
|
|---|---|
| Published in |
IEEE Transactions on Electron Devices, January 2023
|
| DOI | 10.1109/ted.2023.3236914 |
| Authors |
Chia-Chuan Wu, William Cheng-Yu, Ting-Chang Chang, Yu-Xuan Wang, Mao-Chou Tai, Yu-Fa Tu, Yu-An Chen, Hong-Yi Tu, Ya-Ting Chien, Han-Yu Chang, Bo-Shen Huang |
Attention Score in Context
This research output has an Altmetric Attention Score of 7. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 07 March 2023.
All research outputs
#4,841,279
of 25,394,764 outputs
Outputs from IEEE Transactions on Electron Devices
#507
of 6,542 outputs
Outputs of similar age
#98,513
of 472,368 outputs
Outputs of similar age from IEEE Transactions on Electron Devices
#2
of 10 outputs
Altmetric has tracked 25,394,764 research outputs across all sources so far. Compared to these this one has done well and is in the 79th percentile: it's in the top 25% of all research outputs ever tracked by Altmetric.
So far Altmetric has tracked 6,542 research outputs from this source. They receive a mean Attention Score of 4.0. This one has done particularly well, scoring higher than 91% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 472,368 tracked outputs that were published within six weeks on either side of this one in any source. This one has done well, scoring higher than 77% of its contemporaries.
We're also able to compare this research output to 10 others from the same source and published within six weeks on either side of this one. This one has scored higher than 8 of them.