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Atomistic description of Si etching with HCl

Overview of attention for article published in Applied Surface Science, June 2024
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  • Average Attention Score compared to outputs of the same age
  • High Attention Score compared to outputs of the same age and source (81st percentile)

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Title
Atomistic description of Si etching with HCl
Published in
Applied Surface Science, June 2024
DOI 10.1016/j.apsusc.2024.159836
Authors

Biel Martinez, Jing Li, Hector Prats, Benoit Sklénard

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Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 3. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 12 March 2024.
All research outputs
#14,605,182
of 25,478,886 outputs
Outputs from Applied Surface Science
#3,718
of 5,452 outputs
Outputs of similar age
#2,063
of 3,891 outputs
Outputs of similar age from Applied Surface Science
#3
of 11 outputs
Altmetric has tracked 25,478,886 research outputs across all sources so far. This one is in the 42nd percentile – i.e., 42% of other outputs scored the same or lower than it.
So far Altmetric has tracked 5,452 research outputs from this source. They receive a mean Attention Score of 3.4. This one is in the 31st percentile – i.e., 31% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 3,891 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 46th percentile – i.e., 46% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 11 others from the same source and published within six weeks on either side of this one. This one has done well, scoring higher than 81% of its contemporaries.