Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses

Overview of attention for article published in Nanoscale Advances, January 2024

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RT @DrFrederickChen: The latest EUV work supported by TSMC showcases a resist based on a highly hydroxylated hafnium cluster which offers 3…

The latest EUV work supported by TSMC showcases a resist based on a highly hydroxylated hafnium cluster which offers 36 nm pitch resolution at 30 mJ/cm2. As there was no mask or hydrogen, thickness loss and blur are due to secondary electrons. https://t…

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