EUV pellicle technology for high volume wafer production

Overview of attention for article published in Proceedings of SPIE, November 2023

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In the top 25% of all research outputs scored by Altmetric
Good Attention Score compared to outputs of the same age (77th percentile)
High Attention Score compared to outputs of the same age and source (96th percentile)

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EUV Pellicle Technology Advances Carbon nanotubes emerge as most promising material for EUV pellicles in next-gen high-power scanners. Canatu collaborates with Imec on breakthrough technology. - https://t.co/UBmMerEJo0 - https://t.co/NbSHoA1D68

@chyang888 TSMC actually published some of their work with pellicles, mixed messages actually..https://t.co/mriVPmJeJl, https://t.co/wmGnr8G8JX

RT @DrFrederickChen: TSMC EUV pellicle may only survive 5000 wafer exposures before rupturing at 400W power, high dose condition. https://t…

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