Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists

Overview of attention for article published in Journal of Vacuum Science & Technology: Part B, November 2006

Altmetric Badge

Mentioned by

patent: 1 patent

Readers on

mendeley: 29 Mendeley

So far, Altmetric has seen 1 patent that references this research output.

Electron beam lithography with a bilayer resist

Grant US-12248248-B2

United States of America

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity.