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Enhanced Edge Etching Resistance and EUV Lithographic Performance of a Tin-Oxide Photoresist via a Blend Strategy

Overview of attention for article published in ACS Applied Nano Materials, September 2025
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About this Attention Score

  • In the top 25% of all research outputs scored by Altmetric
  • High Attention Score compared to outputs of the same age (89th percentile)
  • High Attention Score compared to outputs of the same age and source (97th percentile)

Mentioned by

news
1 news outlet
twitter
3 X users

Readers on

mendeley
4 Mendeley
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Article details
Title
Enhanced Edge Etching Resistance and EUV Lithographic Performance of a Tin-Oxide Photoresist via a Blend Strategy
Published in
ACS Applied Nano Materials, September 2025
DOI 10.1021/acsanm.5c03131
Authors

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Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 11. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 16 April 2026.
All research outputs
#4,058,047
of 32,464,683 outputs
Outputs from ACS Applied Nano Materials
#184
of 5,416 outputs
Outputs of similar age
#36,374
of 336,836 outputs
Outputs of similar age from ACS Applied Nano Materials
#3
of 119 outputs
Altmetric has tracked 32,464,683 research outputs across all sources so far. Compared to these this one has done well and is in the 87th percentile: it's in the top 25% of all research outputs ever tracked by Altmetric.
So far Altmetric has tracked 5,416 research outputs from this source. They receive a mean Attention Score of 3.2. This one has done particularly well, scoring higher than 96% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 336,836 tracked outputs that were published within six weeks on either side of this one in any source. This one has done well, scoring higher than 89% of its contemporaries.
We're also able to compare this research output to 119 others from the same source and published within six weeks on either side of this one. This one has done particularly well, scoring higher than 97% of its contemporaries.