Synthesis and characterization of poly(acrylate amic acid) and its application as negative‐tone photosensitive polyimides

Overview of attention for article published in Journal of Applied Polymer Science, July 2009

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Photosensitive polyimide, preparation method thereof and photosensitive composition

Application CN-118005922-A

China

Polyimide positive photoresist composition

Grant CN-112859523-B

China

Polyimide positive photoresist composition

Application CN-112859523-A

China

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