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Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Overview of attention for article published in Proceedings of SPIE, August 2004
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About this Attention Score

  • In the top 25% of all research outputs scored by Altmetric
  • High Attention Score compared to outputs of the same age (80th percentile)
  • High Attention Score compared to outputs of the same age and source (90th percentile)

Mentioned by

patent
6 patents

Readers on

mendeley
5 Mendeley
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Article details
Title
Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond
Published in
Proceedings of SPIE, August 2004
DOI 10.1117/12.557745
Authors

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Timeline Attention over time Attention Score history
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Activity
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Mendeley demographics

Mendeley demographics

The data shown below were compiled from readership statistics for 5 Mendeley readers of this research output. Click here to see the associated Mendeley record.
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Geographical breakdown

Geographical breakdown
Country Count As %
United States 1 20%
Unknown 4 80%

Demographic breakdown

Readers by professional status
Readers by professional status Count As %
Other 1 20%
Professor 1 20%
Student > Doctoral Student 1 20%
Unknown 2 40%
Readers by discipline
Readers by discipline Count As %
Engineering 2 40%
Economics, Econometrics and Finance 1 20%
Unknown 2 40%
Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 9. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 16 October 2012.
All research outputs
#5,140,598
of 34,360,257 outputs
Outputs from Proceedings of SPIE
#2,096
of 60,460 outputs
Outputs of similar age
#12,050
of 92,585 outputs
Outputs of similar age from Proceedings of SPIE
#23
of 695 outputs
Altmetric has tracked 34,360,257 research outputs across all sources so far. Compared to these this one has done well and is in the 83rd percentile: it's in the top 25% of all research outputs ever tracked by Altmetric.
So far Altmetric has tracked 60,460 research outputs from this source. They receive a mean Attention Score of 4.2. This one has done particularly well, scoring higher than 90% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 92,585 tracked outputs that were published within six weeks on either side of this one in any source. This one has done well, scoring higher than 80% of its contemporaries.
We're also able to compare this research output to 695 others from the same source and published within six weeks on either side of this one. This one has done particularly well, scoring higher than 90% of its contemporaries.