Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Overview of attention for article published in Proceedings of SPIE, August 2004

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In the top 25% of all research outputs scored by Altmetric
High Attention Score compared to outputs of the same age (80th percentile)
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patent: 6 patents

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mendeley: 5 Mendeley

So far, Altmetric has seen 6 patents that reference this research output.

Non-linear rasterized contour filters

Grant US-8291353-B2

United States of America

16 Oct 2012

Semiconductor device and manufacturing method thereof

Grant US-7863753-B2

United States of America

04 Jan 2011

Modeling mask corner rounding effects using multiple mask layers

Grant US-7853919-B2

United States of America

14 Dec 2010

Facilitating process model accuracy by modeling mask corner rounding effects

Grant US-7707539-B2

United States of America

27 Apr 2010

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