Prediction of Plasma Charging Induced Gate Oxide Tunneling Current and Antenna Dependence by Plasma Charging Probe

Overview of attention for article published in this source, January 1996

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So far, Altmetric has seen 4 patents that reference this research output.

Wafer probe for measuring plasma and surface characteristics in plasma processing…

Grant US-7192505-B2

United States of America

Method of protecting a semiconductor integrated circuit from plasma damage

Grant US-7178126-B2

United States of America

Wafer probe for measuring plasma and surface characteristics in plasma processing…

Grant US-6830650-B2

United States of America

Method of real-time plasma charging voltage measurement on powered electrode with…

Grant US-6673636-B2

United States of America

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