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Double exposure for the contact layer of the 65-nm node
Overview of attention for article published in Proceedings of SPIE, May 2005
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56
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Patents
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56
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Resist composition and patterning process
Grant US-10131730-B2
United States of America
20 Nov 2018
Resist composition and patterning process
Grant US-9709890-B2
United States of America
18 Jul 2017
Patterning process and resist composition
Grant US-9551932-B2
United States of America
24 Jan 2017
Patterning process and resist composition
Grant US-9519213-B2
United States of America
13 Dec 2016
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