Operation Characterization of Flash Memory with Silicon Nitride/Silicon Dioxide Stack Tunnel Dielectric

Overview of attention for article published in Japanese Journal of Applied Physics, March 2005

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Plasma enhanced chemical vapor deposition of films for improved vertical etch performance…

Grant US-11365476-B2

United States of America

Plasma enhanced chemical vapor deposition of films for improved vertical etch performance…

Grant US-10246772-B2

United States of America

Nonvolatile semiconductor memory device, semiconductor device and manufacturing method of…

Grant US-8093126-B2

United States of America

Nonvolatile semiconductor memory device, semiconductor device and manufacturing method of…

Grant US-7883967-B2

United States of America

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