Monolithic integration of capacitive sensors using a double-side CMOS MEMS post process

Overview of attention for article published in Journal of Micromechanics & Microengineering, December 2008

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So far, Altmetric has seen 3 patents that reference this research output.

Micro-electromechanical apparatus with multiple chambers and method for manufacturing the…

Grant US-9586815-B2

United States of America

Method of forming a suspended structure and a transistor co-integrated on a same substrate

Grant US-9193582-B2

United States of America

Method for producing a component with a suspended structure and a transistor integrated…

Application EP-2741331-A2

European Patent Office

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