Valence band offset and interface stoichiometry at epitaxial Si3N4/Si(111) heterojunctions formed by plasma nitridation

Overview of attention for article published in Applied Physics Letters, December 2009

Altmetric Badge

Mentioned by

patent: 1 patent

Readers on

mendeley: 17 Mendeley

So far, Altmetric has seen 1 patent that references this research output.

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR SUBSTRATE

Application US-20230154748-A1

United States of America

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity.