Low Temperature Plasma Process for Si/SiGe Dual Channel Fin Application

Overview of attention for article published in this source, March 2019

Altmetric Badge

Mentioned by

patent: 2 patents

Readers on

mendeley: 5 Mendeley

So far, Altmetric has seen 2 patents that reference this research output.

Semiconductor device including an active pattern

Grant US-12604492-B2

United States of America

Semiconductor devices

Grant US-12543346-B2

United States of America

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity.