Advanced nanoimprint lithography using a graded functional imprinting material tailored for liquid crystal alignment

Overview of attention for article published in Journal of Applied Physics, September 2007

Altmetric Badge

Mentioned by

patent: 1 patent

Readers on

mendeley: 18 Mendeley

So far, Altmetric has seen 1 patent that references this research output.

THIN-FILM ALIGNMENT LAYER PROVIDED WITH INTEGRALLY-FORMED SPACING STRUCTURES AND FORMING…

Application WO-2016151347-A1

World Intellectual Property Organisation (WIPO)

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity.