On the interpretation of micro-PIXE measurements on a prototype microstructured reference material

Overview of attention for article published in Nuclear Instruments & Methods in Physics Research Section B, April 1999

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Maskless photolithography using plasma displays

Grant US-6764796-B2

United States of America

Maskless 2-D and 3-D pattern generation photolithography

Grant US-6544698-B1

United States of America

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