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The effects of ion implantation on the interdiffusion coefficients in In x Ga1− x As/GaAs quantum well structures

Overview of attention for article published in Journal of Applied Physics, February 1993
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About this Attention Score

  • In the top 25% of all research outputs scored by Altmetric
  • High Attention Score compared to outputs of the same age (84th percentile)
  • High Attention Score compared to outputs of the same age and source (81st percentile)

Mentioned by

patent
3 patents

Readers on

mendeley
13 Mendeley
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Article details
Title
The effects of ion implantation on the interdiffusion coefficients in In x Ga1− x As/GaAs quantum well structures
Published in
Journal of Applied Physics, February 1993
DOI 10.1063/1.353204
Authors

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Timeline Attention over time Attention Score history
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Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 13 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Geographical breakdown
Country Count As %
Unknown 13 100%

Demographic breakdown

Readers by professional status
Readers by professional status Count As %
Student > Ph. D. Student 3 23%
Student > Master 2 15%
Researcher 2 15%
Student > Doctoral Student 1 8%
Student > Bachelor 1 8%
Other 0 0%
Unknown 4 31%
Readers by discipline
Readers by discipline Count As %
Physics and Astronomy 4 31%
Materials Science 2 15%
Engineering 2 15%
Unknown 5 38%
Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 6. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 29 July 2003.
All research outputs
#4,742,851
of 22,973,051 outputs
Outputs from Journal of Applied Physics
#1,286
of 20,533 outputs
Outputs of similar age
#5,655
of 71,545 outputs
Outputs of similar age from Journal of Applied Physics
#4
of 82 outputs
Altmetric has tracked 22,973,051 research outputs across all sources so far. Compared to these this one has done well and is in the 76th percentile: it's in the top 25% of all research outputs ever tracked by Altmetric.
So far Altmetric has tracked 20,533 research outputs from this source. They receive a mean Attention Score of 3.7. This one has done well, scoring higher than 84% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 71,545 tracked outputs that were published within six weeks on either side of this one in any source. This one has done well, scoring higher than 84% of its contemporaries.
We're also able to compare this research output to 82 others from the same source and published within six weeks on either side of this one. This one has done well, scoring higher than 81% of its contemporaries.