High optical quality InAs site-controlled quantum dots grown on soft photocurable nanoimprint lithography patterned GaAs substrates

Overview of attention for article published in Applied Physics Letters, October 2009

Altmetric Badge

Mentioned by

patent: 1 patent

Readers on

mendeley: 24 Mendeley

So far, Altmetric has seen 1 patent that references this research output.

METHOD OF FABRICATING SEMICONDUCTOR QUANTUM DOTS USING NANOIMPRINT LITHOGRAPHY

Application WO-2011134857-A1

World Intellectual Property Organisation (WIPO)

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity.