Deposition and characterization of silicon dioxide thin films deposited by mercury-arc-source driven photon-activated chemical-vapor deposition

Overview of attention for article published in Journal of Vacuum Science & Technology: Part B, January 1988

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Method for deposition of thin silica films at low temperature

Application EP-0659902-A1

European Patent Office

Process for the deposition of thin layers of silica at low temperature and deposition…

Application FR-2712309-A1

France

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