Initiated chemical vapor deposition (iCVD) of copolymer thin films

Overview of attention for article published in Thin Solid Films, January 2008

Altmetric Badge

Mentioned by

patent: 2 patents

Readers on

mendeley: 29 Mendeley

So far, Altmetric has seen 2 patents that reference this research output.

Thin Films with Micro-Topologies Prepared by Sequential Wrinkling

Application US-20140017454-A1

United States of America

FABRICATION OF ANTI-FOULING SURFACES COMPRISING A MICRO- OR NANO-PATTERNED COATING

Application US-20120058302-A1

United States of America

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity.