A critical examination of submicron optical lithography using simulated projection images

Overview of attention for article published in Journal of Vacuum Science & Technology: Part B, October 1983

Altmetric Badge

Mentioned by

patent: 7 patents

Readers on

mendeley: 3 Mendeley

So far, Altmetric has seen 7 patents that reference this research output.

Imaging method for manufacture of microdevices

Grant US-6084655-A

United States of America

Photolithography mask using serifs and method thereof

Grant US-5707765-A

United States of America

Phase shifting mask structure with multilayer optical coating for improved transmission

Grant US-5472811-A

United States of America

Method of fabricating phase shifters with absorbing/attenuating sidewalls using an…

Grant US-5418095-A

United States of America

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity, including 3 additional patents.