The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)

Overview of attention for article published in Thin Solid Films, November 1998

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In the top 25% of all research outputs scored by Altmetric
High Attention Score compared to outputs of the same age (81st percentile)
High Attention Score compared to outputs of the same age and source (82nd percentile)

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patent: 8 patents

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So far, Altmetric has seen 8 patents that reference this research output.

Oxide coating with adjustable ion permeability as optical and protective coating and…

Application CN-118043288-A

China

14 May 2024

Method of forming a patterned structure and device thereof

Grant US-11803125-B2

United States of America

31 Oct 2023

METHOD FOR CURING LOW DIELECTRIC CONSTANT FILM USING DIRECT CURRENT BIAS

Application WO-2004063422-A3

World Intellectual Property Organisation (WIPO)

22 Sep 2005

METHOD FOR PRODUCING A SEMICONDUCTOR PRODUCT

Application WO-2005062348-A1

World Intellectual Property Organisation (WIPO)

07 Jul 2005

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