HF Etchant Solutions in Supercritical Carbon Dioxide for “Dry” Etch Processing of Microelectronic Devices
Overview of attention for article published in Chemistry of Materials, June 2003
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In the top 25% of all research outputs scored by Altmetric
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High Attention Score compared to outputs of the same age (81st percentile)
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High Attention Score compared to outputs of the same age and source (83rd percentile)
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