Silicon surface cleaning by low dose argon-ion bombardment for low-temperature (750 °C) epitaxial deposition. II. Epitaxial quality
Overview of attention for article published in Journal of Applied Physics, October 1987
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In the top 25% of all research outputs scored by Altmetric
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High Attention Score compared to outputs of the same age (87th percentile)
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High Attention Score compared to outputs of the same age and source (91st percentile)
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