Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition
Overview of attention for article published in Thin Solid Films, January 2003
Altmetric Badge
About this Attention Score
-
High Attention Score compared to outputs of the same age (80th percentile)
-
Good Attention Score compared to outputs of the same age and source (76th percentile)
Readers on
- mendeley
- 8 Mendeley