Growth Inhibition to Enhance Conformal Coverage in Thin Film Chemical Vapor Deposition

Overview of attention for article published in Journal of the American Chemical Society, December 2008

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Area-selective method for forming thin film by using nuclear growth retardation

Grant US-12252781-B2

United States of America

AREA-SELECTIVE EMTHOD FOR FORMING THIN FILM BY USING NUCLEAR GROWTH RETARDATION

Application US-20240068091-A1

United States of America

Area selective CVD of metallic films using precursor gases and inhibitors

Grant US-11584986-B1

United States of America

Use of an inhibitor molecule in chemical vapor deposition to afford deposition of copper…

Grant US-10103057-B2

United States of America

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