Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition

Overview of attention for article published in Applied Physics Letters, October 2009

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Area selective CVD of metallic films using precursor gases and inhibitors

Grant US-11584986-B1

United States of America

Smoothing agents to enhance nucleation density in thin film chemical vapor deposition

Grant US-8846146-B2

United States of America

Surface preparation for thin film growth by enhanced nucleation

Grant US-8110503-B2

United States of America

Surface preparation for thin film growth by enhanced nucleation

Grant US-7943527-B2

United States of America

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