↓ Skip to main content

Multilevel Anti-Fuse Cells by Progressive Rupturing of the High- $\kappa $ Gate Dielectric in FinFET Technologies

Overview of attention for article published in IEEE Electron Device Letters, July 2016
Altmetric Badge

About this Attention Score

  • Average Attention Score compared to outputs of the same age

Mentioned by

patent
3 patents

Readers on

mendeley
8 Mendeley