Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy

Overview of attention for article published in Journal of Applied Physics, May 1996

Altmetric Badge

Mentioned by

patent: 8 patents

Readers on

mendeley: 76 Mendeley

So far, Altmetric has seen 8 patents that reference this research output.

Apparatus including a plasma chamber and controller including instructions for forming a…

Grant US-8479683-B2

United States of America

High compressive stress carbon liners for MOS devices

Grant US-8362571-B1

United States of America

Depositing conformal boron nitride film by CVD without plasma

Grant US-8288292-B2

United States of America

High compressive stress carbon liners for MOS devices

Grant US-7906817-B1

United States of America

This page shows the most recent patents that mention this research output. Click here to find out how to access more activity, including 4 additional patents.