↓ Skip to main content

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing

Overview of attention for article published in Nano Research, July 2016
Altmetric Badge

About this Attention Score

  • Average Attention Score compared to outputs of the same age

Mentioned by

twitter
2 tweeters
facebook
1 Facebook page

Citations

dimensions_citation
5 Dimensions

Readers on

mendeley
16 Mendeley