Title |
Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances
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Published in |
Discover Nano, August 2016
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DOI | 10.1186/s11671-016-1567-6 |
Pubmed ID | |
Authors |
Martijn van Sebille, Jort Allebrandi, Jim Quik, René A.C. M. M. van Swaaij, Frans D. Tichelaar, Miro Zeman |
Abstract |
We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limited range is calculated using the stoichiometry of the as-deposited film and the crystallinity of the annealed film as input parameters. Multiplying this probability with the nanocrystal density results in the density of non-touching and closely spaced silicon nanocrystals. This method can be used to estimate the best as-deposited stoichiometry in order to achieve optimal nanocrystal density and spacing after a subsequent annealing step. |
Mendeley readers
Geographical breakdown
Country | Count | As % |
---|---|---|
Unknown | 16 | 100% |
Demographic breakdown
Readers by professional status | Count | As % |
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Student > Master | 4 | 25% |
Student > Ph. D. Student | 4 | 25% |
Researcher | 2 | 13% |
Other | 1 | 6% |
Student > Postgraduate | 1 | 6% |
Other | 0 | 0% |
Unknown | 4 | 25% |
Readers by discipline | Count | As % |
---|---|---|
Physics and Astronomy | 5 | 31% |
Engineering | 3 | 19% |
Materials Science | 2 | 13% |
Chemistry | 1 | 6% |
Unknown | 5 | 31% |