Method for producing and testing a corrosion-resistant channel in a silicon device Grant US-6869818-B2 United States of America 22 Mar 2005
Method of manufacturing semiconductor device using a hagolen plasma treatment step Grant US-5620925-A United States of America 15 Apr 1997
Method for plasma etching tapered and stepped vias Grant US-5354386-A United States of America 11 Oct 1994