An ultrahigh vacuum system for the fabrication and characterization of ultrathin metal–semiconductor films and sensors

Overview of attention for article published in Review of Scientific Instruments, April 1999

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Chemical sensor using chemically induced electron-hole production at a Schottky barrier

Grant US-7391056-B2

United States of America

Chemical sensor using chemically induced electron-hole production at a schottky barrier

Grant US-7385271-B2

United States of America

Chemical sensor using chemically induced electron-hole production at a Schottky barrier

Grant US-7282778-B2

United States of America

Chemical sensor using chemically induced electron-hole production at a schottky barrier

Grant US-7274082-B2

United States of America

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