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Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask block copolymer self-assembly

Overview of attention for article published in Journal of Colloid & Interface Science, December 2018
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About this Attention Score

  • Above-average Attention Score compared to outputs of the same age (62nd percentile)
  • High Attention Score compared to outputs of the same age and source (90th percentile)

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5 tweeters
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1 Facebook page

Readers on

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11 Mendeley
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Title
Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask block copolymer self-assembly
Published in
Journal of Colloid & Interface Science, December 2018
DOI 10.1016/j.jcis.2018.06.018
Pubmed ID
Authors

Anushka S. Gangnaik, Tandra Ghoshal, Yordan M. Georgiev, Michael A. Morris, Justin D. Holmes

Abstract

Films of self assembled diblock copolymers (BCPs) have attracted significant attention for generating semiconductor nanoarrays of sizes below 100 nm through a simple low cost approach for device fabrication. A challenging abstract is controlling microdomain orientation and ordering dictated by complex interplay of surface energies, polymer-solvent interactions and domain spacing. In context, microphase separated poly (styrene-b-ethylene oxide) (PS-b-PEO) thin films is illustrated to fabricate nanopatterns on silicon and germanium materials trenches. The trenched templates was produced by simple electron beam lithography using hydrogen silsesquioxane (HSQ) resist. The orientation of PEO, minority cylinder forming block, was controlled by controlling trench width and varying solvent annealing parameters viz. temperature, time etc. A noticeable difference in microdomain orientation was observed for Si and Ge trenches processed under same conditions. The Ge trenches promoted horizontal orientations compared to Si due to difference in surface properties without any prior surface treatments. This methodology allows to create Ge nanopatterns for device fabrication since native oxides on Ge often induce patterning challenges. Subsequently, a selective metal inclusion method was used to form hardmask nanoarrays to pattern transfer into those substrates through dry etching. The hardmask allows to create good fidelity, low line edge roughness (LER) materials nanopatterns.

Twitter Demographics

The data shown below were collected from the profiles of 5 tweeters who shared this research output. Click here to find out more about how the information was compiled.

Mendeley readers

The data shown below were compiled from readership statistics for 11 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 11 100%

Demographic breakdown

Readers by professional status Count As %
Student > Bachelor 3 27%
Student > Ph. D. Student 1 9%
Professor 1 9%
Lecturer > Senior Lecturer 1 9%
Student > Master 1 9%
Other 2 18%
Unknown 2 18%
Readers by discipline Count As %
Engineering 3 27%
Materials Science 3 27%
Physics and Astronomy 1 9%
Psychology 1 9%
Mathematics 1 9%
Other 0 0%
Unknown 2 18%

Attention Score in Context

This research output has an Altmetric Attention Score of 4. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 01 August 2018.
All research outputs
#5,066,591
of 16,585,337 outputs
Outputs from Journal of Colloid & Interface Science
#756
of 4,144 outputs
Outputs of similar age
#104,423
of 281,616 outputs
Outputs of similar age from Journal of Colloid & Interface Science
#5
of 40 outputs
Altmetric has tracked 16,585,337 research outputs across all sources so far. This one has received more attention than most of these and is in the 69th percentile.
So far Altmetric has tracked 4,144 research outputs from this source. They receive a mean Attention Score of 3.2. This one has done well, scoring higher than 81% of its peers.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 281,616 tracked outputs that were published within six weeks on either side of this one in any source. This one has gotten more attention than average, scoring higher than 62% of its contemporaries.
We're also able to compare this research output to 40 others from the same source and published within six weeks on either side of this one. This one has done particularly well, scoring higher than 90% of its contemporaries.