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Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask block copolymer self-assembly

Overview of attention for article published in Journal of Colloid & Interface Science, December 2018
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  • Above-average Attention Score compared to outputs of the same age (62nd percentile)
  • High Attention Score compared to outputs of the same age and source (90th percentile)

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