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Physics-driven pattern adjustment for direct 3D garment editing

Overview of attention for article published in ACM Transactions on Graphics, July 2016
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Mentioned by

patent
5 patents

Citations

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74 Dimensions

Readers on

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56 Mendeley
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Title
Physics-driven pattern adjustment for direct 3D garment editing
Published in
ACM Transactions on Graphics, July 2016
DOI 10.1145/2897824.2925896
Authors

Aric Bartle, Alla Sheffer, Vladimir G. Kim, Danny M. Kaufman, Nicholas Vining, Floraine Berthouzoz

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 56 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
United States 1 2%
Unknown 55 98%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 16 29%
Student > Master 12 21%
Researcher 5 9%
Student > Doctoral Student 3 5%
Student > Bachelor 2 4%
Other 4 7%
Unknown 14 25%
Readers by discipline Count As %
Computer Science 26 46%
Design 7 13%
Engineering 7 13%
Arts and Humanities 1 2%
Medicine and Dentistry 1 2%
Other 0 0%
Unknown 14 25%