Methods for making hard masks useful in next-generation lithography Grant US-11921427-B2 United States of America 05 Mar 2024
Eliminating yield impact of stochastics in lithography Grant US-11257674-B2 United States of America 22 Feb 2022
Vacuum-integrated hardmask processes and apparatus Grant US-11209729-B2 United States of America 28 Dec 2021