Plasma-assisted etching

Overview of attention for article published in Plasma Chemistry and Plasma Processing, March 1982

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In the top 25% of all research outputs scored by Altmetric
One of the highest-scoring outputs from this source (#10 of 208)
High Attention Score compared to outputs of the same age (91st percentile)

Mentioned by

patent: 13 patents

wikipedia: 4 Wikipedia pages

Citations

dimensions_citation: 184 Dimensions

Readers on

mendeley: 50 Mendeley

Summary Patents Wikipedia Dimensions citations

So far, Dimensions has found 184 publications that cite this research output.

184

The most recent citing publications are shown below. View all 184 publications that cite this research output on Dimensions.

Construction and validation of C3F8 electron impact and heavy particle reaction scheme for modeling plasma discharges

Article in Physics of Plasmas (March 2024)

Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process

Article in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (October 2023)

Dissociative electron attachment to c-C4F8 molecules and clusters

Article in The European Physical Journal D (April 2023)

This page shows the most recent citations of this research output.

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